Product Overview

The high-efficiency RF plasma crackers of FERMI instrument adopts an original RF focusing excitation technology. Four different high-efficiency solid-state RF drivers (13.56 MHz / 433 MHz / 915 MHz / 2450 MHz) can be used as power supplies without complex RF matching network, which can significantly improve the ionization efficiency of gas. The stability and uniformity of atoms / ions can be optimized by adjusting the small holes structure. Comparing to the traditional RF crackers, these crackers can reduce the beam instability caused by switching the valve and the RF power. These crackers can generate different plasma sources such as nitrogen source, oxygen source and hydrogen source with discharge cracking chamber of different materials. These crackers can be widely used in molecular beam epitaxy (MBE) systems, including the growth of nitrides and oxide, the implantation and doping of nitrogen and oxygen atoms, the surface cleaning with hydrogen and etc.

Specification

●  An original RF focusing excitation technology: high efficiency of gas ionization and high stability of plasma source

●  Four kinds of solid-state RF drivers with simple structure, simple RF matching network, and easy to operate

●  Suitable for N2, O2, H2, CH4, Ar, Kr and other working gases

●  Compact design for UHV, suitable for CF35 / CF63 / CF100 and other mounting ports

●  Three main application directions: atomic source for MBE film growth, ion source for surface modification and vacuum surface cleaning

Test Report