Product Overview

FERMI-RFPS-200 is a high efficiency RF plasma source which can excite plasma in vacuum chamber by coil structure. It is widely used in Molecular Beam Epitaxial system (MBE).

Specification

●  Efficient and stable Nitride, Oxide, Hydride growth

●  Precise control performance, Easy to use

●  Replacement of lead-out ports

●  There are atomic screening holes in which the ions reach the substrate as little as possible.

●  Suitable for MBE, Vacuum decomposition coating, Hydrogen atom substrate cleaning and other systems

Test Curve

Atomic hydrogen substrate deoxidization and epitaxial test:

RF ion source for MBE growth: vacuum decomposition coating system