상세테이블
Deposition Chamber size |
φ260mm spherical |
Substrate heating |
10mm square, Diode laser heating |
Substrate tempurature monitor |
Pyrometer |
Target |
φ20mm×4
Target-laser synchroneizer (PC and software) |
Load-lock transfar module |
100mm×200mmH
Transfar rod, 2 substrates, 2 targets |
Main vaccum pump |
Ceramics bearing TMP 300L/s |
Combinatorial mask mechanism |
Motor driven. 2 Masks |
RHEED |
Parallel Scannin RHEED, RHEED pattern processing system |
1. Growth chamber
상세테이블
Arrival pressure |
less than 6.7×10-7Pa (5×10-9Torr) |
Chamber |
ca. φ300mm×500mm high. cylindrical(SUS304) |
Exhaust speed |
less than 10-4Pa (10-6Torr)
in 20 minutes |
Substrate holder with radiation
heating by infrared lamp |
Heating temperature : |
more than 800°C within 15mm square of substrate
holder |
Temperature uniformity : |
less than?±2.5°C within 15mm square |
Substrate size : |
up to φ50mm |
Substrate movement : |
X : ±10mm |
Y : ±10mm |
Z1 : ±20mm |
Z2 : 0~20mm |
Rotation : AC motor driven |
Shutter for substrate |
CF1.33", pneumatic Flange CF10" |
Flange |
CF10" |
Water cooling |
Power control |
Programmable PID controlled DC |
power supply |
Thermocouple |
Type R |
|
Target holder with revolver |
Target loading |
φ20mm×4 (6 : optional) |
Target movement |
Horizontal X : ±10mm |
Horizontal Y : ±10mm |
Vertical Z : ±20mm |
Target spin mechanism |
Motor driven via mgnetic rotation feedthrough |
Revolution mechanism |
Stepping-motor driven |
|
Process gas flow |
via variable leak valve for O2 |
via manual valve for O2 at around
atmospheric pressure |
reserve port for gas inlet |
|
Laser irradiation |
via synthesized quartz window (CF4.5")
at an angle of 45° to a target |
Window trasparency |
more than 93% for ArF |
more than 93% for KrF |
|
Vacuum gauges |
for UHV |
nude ionization gauge |
for low vacuum |
Capacitance manometor 1Torr |
|
Pumps |
Main pump |
magnetic-bearing TMP (800L/s) for wide-vacuum-range
use |
Rotary pump |
275L/m |
Main valve |
6" pneumatic |
Baypass line |
pneumatic and manual operation |
Pressure monitor |
|
Bake-out heater |
Sheath heater and tape heater |
Temperature controllable range |
100°C ~ 200°C |
|
Ports |
for target observation |
CF6" |
for thickness monitor or mask |
CF6" |
for cells |
CF4.5" ×2 |
for temperature measurement |
CF4.5" |
for gasintroduction |
CF2.75" |
for RHEED gun |
CF4.5" |
for RHEED screen |
CF6" |
|
2. Load-lock and substrate transfer mechanism
3. system rack
4. Utilities
5. Control system
Specifications may subject to change for improvement without notice.